发明名称 Film-like wafer mold material and molded wafer
摘要 <p>The invention provides a film-like wafer mold material for molding a wafer in a lump, the material comprising a multilayer structure constituted of at least a first film layer and a second film layer provided on the first film layer, wherein the first film layer contains a silicone-backbone-containing polymer, a cross-linking agent, and a filler, and the second film layer contains a silicone-backbone-containing polymer and a cross-linking agent, and further contains a filler in such a manner that a content rate of the filler becomes 0 or above and less than 100 when a content rate of the filler contained in the first film layer is assumed to be 100. There can be a film-like wafer mold material that has excellent transference performance with respect to a thin-film wafer with a large diameter, also has low-warp properties and excellent wafer protection performance after form shaping (after molding), and is preferably used for a wafer level package.</p>
申请公布号 EP2500934(B1) 申请公布日期 2015.10.21
申请号 EP20120001467 申请日期 2012.03.05
申请人 SHIN-ETSU CHEMICAL CO., LTD. 发明人 SUGO, MICHIHIRO;KONDO, KAZUNORI
分类号 H01L23/29;C08G59/40;C08G59/42;C08K3/36;C08K5/5435;C08L63/00;C09D183/14 主分类号 H01L23/29
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