| 摘要 |
<p><P>PROBLEM TO BE SOLVED: To accurately detect a first contact of a probe even when an electrical contact performance of a tip or the like of the probe is deteriorated. <P>SOLUTION: A first contact detection system and a polishing apparatus employing the same are provided in which a first contact is detected where, when polishing a plurality of probes of a probe card, any one of the probes first contacts a polishing material. The first contact detection system comprises an AE sensor, an AE detection device and a control section. The AE sensor detects an elastic wave which is generated with the contact of the probe and propagated in the probe card. The AE detection device detects the first contact based on a detection signal of the AE sensor. Upon receiving a detection signal from the AE detection device, the control section sets a position of the polishing material at that time point to a reference, sets a position resulting from adding the variation of the probes to that reference position as a target position and moves the polishing material up to that target position. <P>COPYRIGHT: (C)2013,JPO&INPIT</p> |
