发明名称 |
HEATING APPARATUS FOR SUBSTRATE |
摘要 |
Disclosed is a substrate heating apparatus. The substrate heating apparatus comprises: a hot plate; a table for supporting the hot plate; a central support unit for supporting a center part of the hot plate to the table; and a peripheral support unit for supporting a peripheral area of the hot plate according to the table being in a state of allowing heat expansion in the plane direction of the hot plate. |
申请公布号 |
KR20150118025(A) |
申请公布日期 |
2015.10.21 |
申请号 |
KR20150041658 |
申请日期 |
2015.03.25 |
申请人 |
JOEUN TECHNOLOGY CO., LTD.;LEE, SAE BOM |
发明人 |
JUNG, DONG JOON;LEE, SAE BOM |
分类号 |
H01L21/324;H01L21/67;H01L21/683 |
主分类号 |
H01L21/324 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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