| 摘要 |
An antireflection multilayer film is formed by alternately laminating high refractive index layers and low refractive index layers having indexes of refraction different from each other. The high refractive index layer is an oblique deposition layer formed by depositing an inorganic material such as tantalum pentoxide onto the surface of an optical element from a diagonal direction, and has minute internal structures composed of slant columnar structures growing along to the deposition direction. The low refractive index layer is an isotropic and dense layer. |
