| 摘要 |
PROBLEM TO BE SOLVED: To provide a polishing pad with excellent polishing speed stability, and to provide a method for manufacturing the polishing pad.SOLUTION: The polishing pad includes a polishing layer composed of a polyurethane resin foam containing miniature pores. The polyurethane resin foam contains a polysiloxane group-containing diol represented by general formula (1) as one of its raw materials, and the content of the polysiloxane group-containing diol is 1-10 wt.% in relation to the total raw materials of the polyurethane resin foam. In the formula, Ris a 1-12C alkyl group, n is an integer of 10-380, and m is an integer of 1-12. |
