发明名称 艶だし剤用組成物およびその製造方法
摘要 <p>Provided is a technology pertaining to a polish with excellent sheen retention, durability, and ability to minimize occurrences of shoe marks and scratches, and in which loss of luster is unlikely to occur even if additional coats are applied. This polishing composition includes core shell structure particles (100) with an average particle size of 40 to 200 nm, and each having a core (150) and a shell (200) covering said core (150). The core (150) contains a copolymer (A) having a glass transition point of -70 to 0°C, and containing 0 to 20 mass% insoluble matter when dissolved in tetrahydrofuran. The shell (200) contains a copolymer (B) with a glass transition point of 20 to 70°C. The core shell structure particles (100) have a weight average molecular weight of 80,000 to 800,000, and contain 0 to 30 mass% insoluble matter when dissolved in tetrahydrofuran.</p>
申请公布号 JP5798555(B2) 申请公布日期 2015.10.21
申请号 JP20120521808 申请日期 2012.05.07
申请人 发明人
分类号 C09G1/16;C08F2/44;C08F265/06 主分类号 C09G1/16
代理机构 代理人
主权项
地址