发明名称 |
Coating treatment method, program, non-transitory computer storage medium and coating treatment apparatus |
摘要 |
<p>A coating treatment method includes: a first step of rotating a substrate at a first rotation number; a second step of rotating the substrate at a second rotation number being slower than the first rotation number; a third step of rotating the substrate at a third rotation number being faster than the second rotation number and slower than the first rotation number; a fourth step of rotating the substrate at a fourth rotation number being slower than the third rotation number; and a fifth step of rotating the substrate at a fifth rotation number being faster than the fourth rotation number. A supply of a coating solution to a central portion of the substrate is continuously performed from the first step to a middle of the second step or during the first step, and the fourth rotation number is more than 0 rpm and 500 rpm or less.</p> |
申请公布号 |
EP2410560(A3) |
申请公布日期 |
2015.10.21 |
申请号 |
EP20110174832 |
申请日期 |
2011.07.21 |
申请人 |
TOKYO ELECTRON LIMITED |
发明人 |
YOSHIHARA, KOUSUKE;HATEKEYAMA, SHINICHI |
分类号 |
H01L21/67 |
主分类号 |
H01L21/67 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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