发明名称 X線分析装置、X線分析システム、X線分析方法およびX線分析プログラム
摘要 <p>An X-ray analysis apparatus converts an X-ray intensity distribution of discrete data determined for each pixel, from a first plane where the distribution is known into a second plane where the distribution is not known. The X-ray analysis apparatus projects onto the second plane, a grid point which specifies a pixel on the first plane and an intermediate point between the grid points, as nodes, calculates an area of a region where a polygon expressing a projected pixel specified by the projected nodes overlaps with each pixel on the second plane, to thereby calculate an occupancy ratio of the polygon expressing the projected pixel to each pixel on the second plane and distributes X-ray intensity in the pixel on the first plane to the pixel on the second plane based on the occupancy ratio, to thereby convert the X-ray intensity distribution.</p>
申请公布号 JP5798526(B2) 申请公布日期 2015.10.21
申请号 JP20120159863 申请日期 2012.07.18
申请人 发明人
分类号 G01N23/207;G01N23/205 主分类号 G01N23/207
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