| 发明名称 | Alignment mark definer | ||
| 摘要 | An alignment mark definer is configured to provide a geometrical definition for an actual alignment structure to be formed at a temporary surface of a substrate based on a desired appearance of the alignment mark and on an expected alteration of an appearance of the actual alignment structure caused by a deposition material deposited on the temporary surface and the actual alignment structure. | ||
| 申请公布号 | US9165889(B2) | 申请公布日期 | 2015.10.20 |
| 申请号 | US201313931396 | 申请日期 | 2013.06.28 |
| 申请人 | Infineon Technologies AG | 发明人 | Ortner Joerg;Campidell Josef;Greiner Andreas |
| 分类号 | H01L23/544 | 主分类号 | H01L23/544 |
| 代理机构 | Slater & Matsil, L.L.P. | 代理人 | Slater & Matsil, L.L.P. |
| 主权项 | 1. An alignment mark definer configured to provide a geometrical definition for an actual alignment structure to be formed at a temporary surface of a substrate based on a desired appearance of an alignment mark and on an expected alteration of an appearance of the actual alignment structure caused by a deposition material deposited on the temporary surface and the actual alignment structure and to provide the geometrical definition for the actual alignment structure based on a reverse estimation of the expected alteration of the appearance of the actual alignment structure. | ||
| 地址 | Neubiberg DE | ||