发明名称 Liquid ejecting apparatus and wiping method
摘要 A liquid ejecting apparatus includes a liquid ejecting unit which includes a nozzle forming surface having nozzle openings for ejecting liquid formed thereon, a wiper which is contactably disposed on the nozzle forming surface, a movement unit which is able to relatively move the liquid ejecting unit and the wiper, and a control unit which controls the movement units such that an interference amount of the wiper and the nozzle forming surface in a position of the wiper which comes in contact with the liquid ejecting unit, is smaller than an interference amount of the wiper and the nozzle forming surface when the wiper is relatively moved through a nozzle region which is a region including the nozzle openings of the nozzle forming surface in a direction along the nozzle forming surface.
申请公布号 US9162464(B2) 申请公布日期 2015.10.20
申请号 US201414446224 申请日期 2014.07.29
申请人 Seiko Epson Corporation 发明人 Mano Takashi
分类号 B41J2/165 主分类号 B41J2/165
代理机构 Workman Nydegger 代理人 Workman Nydegger
主权项 1. A liquid ejecting apparatus comprising: a liquid ejecting unit which includes a nozzle forming surface having nozzle openings for ejecting liquid formed thereon; a wiper which is contactably disposed on the nozzle forming surface; a first movement unit which is able to relatively move the liquid ejecting unit and the wiper in a first direction along the nozzle forming surface; a second movement unit which is able to relatively move the liquid ejecting unit and the wiper in a second direction intersecting with the nozzle forming surface; and a control unit which controls the first movement unit and the second movement unit, wherein the control unit controls the first movement unit such that the wiper comes in contact with the nozzle forming surface after coming into contact with a side of the liquid ejecting unit, and the wiper is relatively moved from one end to the other end of the nozzle forming surface in the first direction while the wiper comes in contact with the nozzle forming surface, and the control unit controls the second movement unit such that a first interference amount which is an interference amount of the wiper and the nozzle forming surface in the second direction in a position of the wiper which comes in contact with the side of the liquid ejecting unit, is smaller than a second interference amount which is an interference amount of the wiper and the nozzle forming surface in the second direction when the wiper is relatively moved through a nozzle region which is a region including the nozzle openings of the nozzle forming surface in the first direction.
地址 Tokyo JP