Exposure method and apparatus, and method for fabricating device with light amount distribution having light larger in four areas

摘要

An exposure method and apparatus for illuminating a pattern with an illumination system to expose a substrate through a projection system. The pattern is illuminated with illumination light with a light amount distribution in which an amount of light is larger in a pair of first areas and a pair of second areas than in an area other than the first and second areas on a pupil plane of the illumination system. The pair of the first areas being arranged outside an optical axis, the pair of the second areas being arranged on the same straight line as the pair of the first areas are arranged on, and the pair of the second areas being arranged outside the pair of the first areas.

主权项

1. An exposure method for illuminating a pattern with an illumination system to expose a substrate through a projection system, the method comprising:
illuminating the pattern with illumination light with a light amount distribution in which an amount of light is larger in a pair of first areas and a pair of second areas than in a third area, the third area being an area other than the first and second areas on a pupil plane of the illumination system and surrounding each of the first and second areas, the pair of the first areas being arranged outside an optical axis, the pair of the second areas being arranged outside the pair of the first areas, each center of gravity of the pair of the first areas and each center of gravity of the pair of the second areas being in the same straight line passing through the optical axis, each of the first areas being surrounded by the third area so as to be out of contact with the pair of second areas; and projecting an image of the pattern illuminated with the illumination light onto the substrate by the projection system.