Immersion liquid, exposure apparatus, and exposure process

摘要

An immersion liquid is provided comprising an ion-forming component, e.g. an acid or a base, which has a relatively high vapor pressure. Also provided are lithography processes and lithography systems using the immersion liquid.

主权项

1. A device manufacturing process comprising:
adding a component, comprising carbon dioxide, to an aqueous liquid; and exposing a photosensitive substrate to radiation, wherein the radiation has passed through the aqueous liquid comprising the component prior to reaching the photosensitive substrate.