发明名称 Proportional and uniform controlled gas flow delivery for dry plasma etch apparatus
摘要 Embodiments of the present invention relate to method and apparatus for providing processing gases to a process chamber with improved uniformity. One embodiment of the present invention provides a gas injection assembly. The gas injection assembly includes an inlet hub, a nozzle having a plurality of injection passages disposed against the inlet hub, and a distribution insert disposed between the nozzle and the inlet hub. The distribution insert has one or more gas distribution passages configured to connect the inlet hub to the plurality of the injection passages the nozzle. Each of the one or more gas distribution passages has one inlet connecting with a plurality of outlets, and distances between the inlet and each of the plurality of outlets are substantially equal.
申请公布号 US9162236(B2) 申请公布日期 2015.10.20
申请号 US201313790735 申请日期 2013.03.08
申请人 APPLIED MATERIALS, INC. 发明人 Nangoy Roy C.;Nguyen Andrew
分类号 B05B1/18;H01L21/67;H01J37/32;C23C16/455;B01F15/02 主分类号 B05B1/18
代理机构 Patterson & Sheridan, LLP 代理人 Patterson & Sheridan, LLP
主权项 1. A gas injection assembly, comprising: an inlet hub having an inner surface defining a ring-shaped recess; a nozzle having a plurality of injection passages; and a distribution insert disposed between the nozzle and the inlet hub, wherein the distribution insert has a ring-shaped body and is disposed in the ring-shaped recess of the inlet hub, first and second gas distribution passages includes channels formed between the distribution insert and the inner surface of the inlet hub, each of the first and second gas distribution passages connects the inlet hub to the plurality of the injection passages of the nozzle, the first gas distribution passage has one first inlet connecting with a plurality of first outlets, distances between the first inlet and each of the plurality of first outlets are substantially equal, the second gas distribution passage has one second inlet connecting with a plurality of second outlets, distances between the second inlet and each of the plurality of second outlets are substantially equal, the ring-shaped body has an inner wall at an inner diameter and an outer wall at an outer diameter, the plurality of first outlets are formed between grooves on the inner wall of the ring-shaped body and the inlet hub, and the plurality of second outlets are formed between grooves on the outer wall of the ring-shaped body and the inlet hub.
地址 Santa Clara CA US