High voltage MOSFET diode reverse recovery by minimizing P-body charges

摘要

This invention discloses a method for manufacturing a semiconductor power device in a semiconductor substrate comprises an active cell area and a termination area. The method comprises the steps of a) growing and patterning a field oxide layer in the termination area and also in the active cell area on a top surface of the semiconductor substrate b) depositing and patterning a polysilicon layer on the top surface of the semiconductor substrate at a gap distance away from the field oxide layer; c) performing a blank body dopant implant to form body dopant regions in the semiconductor substrate substantially aligned with the gap area followed by diffusing the body dopant regions into body regions in the semiconductor substrate; d) implanting high concentration body-dopant regions encompassed in and having a higher dopant concentration than the body regions e) applying a source mask to implant source regions having a conductivity opposite to the body region with the source regions encompassed in the body regions and surrounded by the high concentration body-dopant regions; and f) etching contact trenches into the source, body contact, and body regions.

主权项

1. A semiconductor power device having a drain electrode disposed in a bottom surface of a semiconductor substrate comprises an active cell area and a termination area, wherein:
the semiconductor substrate supports a top epitaxial layer of a first conductivity type having a super-junction structure comprising dopant columns of a second conductivity type extending vertically in said epitaxial layer; a planar gate disposed on top of the epitaxial layer comprising a first planar gate segment and a second planar gate segment separated by a center gap between the first and second planar gate segments; body regions disposed in said top epitaxial layer below outer edges of the first gate segment and the second planar gate segment wherein each of the body regions encompassing a source region of the first conductivity type and each of the body regions extending laterally to a top region of one of the dopant columns; and a Schottky metal layer disposed on top of an insulation layer covering over and completely surrounding the first and second planar gate segments wherein the Schottky metal layer further filling contact trenches opened through the insulation layer at two outer edges of the first and second planar gates and through the center gap between the first and second planar gate segments wherein the contact trenches filled with the Schottky metal layer at two outer edges of the first and second planar gates extending into a top portion of the top epitaxial layer to contact the body regions and the source regions and the Schottky metal filling the trench opened through the center gap between the first and second planar gate segments further extending below the body region and contacting the epitaxial layer.