发明名称 |
Process for preparing 2-chloro-3,3,3-trifluoropropene |
摘要 |
Provided is a process for preparing 2-chloro-3,3,3-trifluoropropene, wherein at least one chlorine-containing compound selected from the group consisting of chloropropane represented by formula (1): CX3CHClCH2Cl, wherein each X is the same or different and each represents Cl or F, chloropropene represented by formula (2): CClY2CCl═CH2, wherein each Y is the same or different and each represents Cl or F, and chloropropene represented by formula (3): CZ2═CClCH2Cl, wherein each Z is the same or different and each represents Cl or F, is used as a starting compound, and said at least one chlorine-containing compound is reacted with hydrogen fluoride while being heated in a gaseous state in the presence of 50 ppm or more of water relative to the chlorine-containing compound. The process of the present invention makes it possible to produce 2-chloro-3,3,3-trifluoropropene (HCFO-1233xf) in a manner that is easily conducted, economically advantageous, and suitable for industrial scale production. |
申请公布号 |
US9162945(B2) |
申请公布日期 |
2015.10.20 |
申请号 |
US201314379044 |
申请日期 |
2013.03.21 |
申请人 |
DAIKIN INDUSTRIES, LTD. |
发明人 |
Kishimoto Masayuki;Komatsu Yuzo |
分类号 |
C07C17/20;C07C17/25 |
主分类号 |
C07C17/20 |
代理机构 |
Wenderoth, Lind & Ponack, L.L.P. |
代理人 |
Wenderoth, Lind & Ponack, L.L.P. |
主权项 |
1. A process for preparing 2-chloro-3,3,3-trifluoropropene comprising:
reacting a chlorine-containing compound with anhydrous hydrogen fluoride while being heated in a gaseous state in the presence of 50 ppm or more of water relative to the total weight of the chlorine-containing compound, the chlorine-containing compound being at least one compound selected from the group consisting of chloropropane represented by formula (1): CX3CHClCH2Cl, wherein each X is the same or different and each represents Cl or F; chloropropene represented by formula (2): CClY2CCl═CH2, wherein each Y is the same or different and each represents Cl or F; and chloropropene represented by formula (3): CZ2═CClCH2Cl, wherein each Z is the same or different and each represents Cl or F. |
地址 |
Osaka JP |