发明名称 |
Micro-channel connection method |
摘要 |
A method of making a connection-pad structure includes providing a substrate and coating a curable layer over the substrate. A group of intersecting micro-channels is embossed in the curable layer. Each micro-channel extends from a surface of the curable layer into the curable layer toward the substrate. The curable layer is cured to form a cured layer having embossed intersecting micro-channels in the cured layer; the group of intersecting micro-channels forms a connection pad. A curable electrical conductor is located in the intersecting micro-channels. The curable electrical conductor is cured to form an electrically continuous cured electrical conductor formed in the group of intersecting micro-channels and an electrical connector is electrically connected to the cured electrical conductor. |
申请公布号 |
US9167700(B2) |
申请公布日期 |
2015.10.20 |
申请号 |
US201313784893 |
申请日期 |
2013.03.05 |
申请人 |
EASTMAN KODAK COMPANY |
发明人 |
Cok Ronald Steven;Trauernicht David Paul |
分类号 |
H05K3/02;G06F3/041;G06F3/045;B05D3/02;H05K3/12;G06F3/044;H05K3/32 |
主分类号 |
H05K3/02 |
代理机构 |
|
代理人 |
Owens Raymond L. |
主权项 |
1. A method of making a connection-pad structure, comprising:
providing a substrate; coating a curable layer directly on the substrate; embossing the curable layer with an embossing stamp to form a group of intersecting micro-channels in the curable layer, each micro-channel extending from a surface of the curable layer into the curable layer toward the substrate; curing the curable layer to form a cured layer having embossed intersecting micro-channels in the cured layer, wherein the group of intersecting micro-channels forms a connection pad; placing a curable electrical conductor in the intersecting micro-channels; curing the curable electrical conductor to form an electrically continuous cured electrical conductor formed in the group of intersecting micro-channels; and electrically connecting an electrical connector to the cured electrical conductor; and wherein the micro-channels have a width less than 20 microns and greater than or equal to 0.5 microns and a depth less than 20 microns and greater than or equal to 0.5 microns. |
地址 |
Rochester NY US |