发明名称 Implant material
摘要 An implant material includes: a base material 10; and a carbonaceous film 20 provided on a surface of the base material 10. The carbonaceous film 20 includes carbon atoms, oxygen atoms, and nitrogen atoms in a surface thereof, and the carbon atoms are bonded to the oxygen atoms to form carboxyl carbon and carbon having a single bond with oxygen. In the surface of the carbonaceous film 20, a content of nitrogen atoms is greater than or equal to 8.0 at. %, a content of carbon having a single bond with oxygen is greater than or equal to 5.4%, and a content of carboxyl carbon is less than or equal to 3.1%.
申请公布号 US9163149(B2) 申请公布日期 2015.10.20
申请号 US201113807267 申请日期 2011.06.30
申请人 TOYO ADVANCED TECHNOLOGIES CO., LTD. 发明人 Mochizuki Akira;Nitta Yuki;Okamoto Keishi;Nakatani Tatsuyuki
分类号 A61F2/28;A61F2/30;A61L27/30;C09D5/00;A61C8/00;A61K6/00;A61C5/08;A61C13/01;A61C13/08 主分类号 A61F2/28
代理机构 Knobbe Martens Olson & Bear LLP 代理人 Knobbe Martens Olson & Bear LLP
主权项 1. An implant material, comprising: a base material; and a carbonaceous film provided on a surface of the base material, wherein the carbonaceous film includes carbon atoms, oxygen atoms, and nitrogen atoms in a surface thereof, the carbon atoms are bonded to the oxygen atoms to form carboxyl carbon and carbon having a single bond with oxygen, a content of nitrogen atoms in the surface of the carbonaceous film is greater than or equal to 8.0 at. %, a content of carbon having a single bond with oxygen in the surface of the carbonaceous film is greater than or equal to 5.4%, and a content of carboxyl carbon in the surface of the carbonaceous film is less than or equal to 3.1%.
地址 Hiroshima JP