发明名称 Method for manufacturing a probe
摘要 A method for manufacturing a probe, includes forming a recess on a sacrificial layer with a resist matching a plane pattern of the probe and a fixing tab connected to the probe, the recess exposing the sacrificial layer, which is on a baseboard, forming the probe and the fixing tab connected to the probe by depositing a probe material in the recess, and removing the resist, removing a portion of the sacrificial layer in an etching process. The portion of the sacrificial layer under the probe is fully removed, while the portion of the sacrificial layer under the fixing tab is left to provide support portions of the sacrificial layer under the fixing tab. Then the probe is removed from the baseboard.
申请公布号 US9164130(B2) 申请公布日期 2015.10.20
申请号 US201314058348 申请日期 2013.10.21
申请人 KABUSHIKI KAISHA NIHON MICRONICS 发明人 Nasu Mika
分类号 H01B13/00;G01R3/00;G01R1/067 主分类号 H01B13/00
代理机构 Leydig, Voit & Mayer, LTD. 代理人 Leydig, Voit & Mayer, LTD.
主权项 1. A method for manufacturing a probe, comprising: forming a recess with a resist, on a sacrificial layer, wherein the recess has a plane pattern of the probe and a fixing tab connected to the probe,the recess exposes the sacrificial layer, andthe sacrificial layer is located on a baseboard; forming the probe and the fixing tab connected to the probe by depositing a probe material in the recess; removing the resist; removing a portion of the sacrificial layer in an etching process, including fully removing the sacrificial layer between the baseboard and the probe, and leaving a remaining portion of the sacrificial layer between the baseboard and the fixing tab, the remaining portion including a plurality of support portions of the sacrificial layer between the baseboard and the fixing tab supporting the probe and the fixing tab on the baseboard; and removing the probe from the baseboard.
地址 Tokyo JP