Method of a fabricating display substrate and method of fabricating a display device using the same

摘要

A method of fabricating a display substrate includes forming a gate electrode on a substrate, forming a gate insulating layer to cover the gate electrode, forming an active layer on the gate insulating layer, forming a metal layer on the active layer, forming a first mask pattern on the metal layer to face a first region of the active layer, forming a second mask pattern on the metal layer to face a second region and a third region of the active layer, etching the metal layer and the active layer using the first and second mask patterns as an etch mask to form a metal pattern and an active pattern, removing the first mask pattern, and etching the metal pattern using the second mask pattern as an etch mask to form a source electrode and a drain electrode.

主权项

1. A method of fabricating a display substrate, comprising:
forming a gate electrode on a substrate; forming a gate insulating layer to cover the gate electrode; forming an active layer on the gate insulating layer; forming a metal layer on the active layer; forming a first mask pattern on the metal layer to face a first region of the active layer; forming a second mask pattern on the metal layer to face a second region and a third region of the active layer; etching the metal layer and the active layer using the first and second mask patterns as an etch mask to form a metal pattern and an active pattern; removing the first mask pattern; and etching the metal pattern using the second mask pattern as an etch mask to form a source electrode and a drain electrode.