发明名称 |
METHOD OF TESTING PATTERN RELIABILITY AND METHOD OF TESTING SEMICONDUCTOR DEVICE USING THEM |
摘要 |
Described is a method for inspecting pattern reliability, which comprises the following steps of: detecting an optical image of a wafer on which a plurality of patterns are formed; evaluating a damage degree of the patterns; checking reliability of the patterns according to the evaluated damage degree; and mapping the reliability of the patterns. |
申请公布号 |
KR20150117153(A) |
申请公布日期 |
2015.10.19 |
申请号 |
KR20140042565 |
申请日期 |
2014.04.09 |
申请人 |
SAMSUNG ELECTRONICS CO., LTD. |
发明人 |
LEE, JEONG JIN;OH, SEUNG HWA;HWANG, CHAN |
分类号 |
H01L21/66;H01L21/027 |
主分类号 |
H01L21/66 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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