ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, AND RESIST FILM, PATTERN FORMING METHOD, MANUFACTURING METHOD OF ELECTRONIC DEVICE AND ELECTRONIC DEVICE WHICH USE THE COMPOSITION

摘要

PROBLEM TO BE SOLVED: To provide: an actinic ray-sensitive or radiation-sensitive resin composition capable of forming a pattern that is excellent in the local pattern dimension uniformity (Local CDU) and exposure latitude (EL) and reduced in the generation of scum and residual water defect; and a pattern forming method, a resist film, a manufacturing method of an electronic device, and an electronic device which use the composition.SOLUTION: An actinic ray-sensitive or radiation-sensitive resin composition comprises: (A) a resin having a repeating unit represented by general formula (I); (B) a compound capable of generating an acid upon irradiation with an actinic ray or radiation; and (C) a resin having at least one repeating unit (x) out of a repeating unit represented by general formula (II) and a repeating unit represented by general formula (III) and containing substantially neither a fluorine atom nor a silicon atom, where the content of the repeating unit (x) is 90 mol% or more based on all repeating units in the resin (C).