METHOD FOR MANUFACTURING MATERIAL FOR CYLINDRICAL SPUTTERING TARGET

摘要

This method is for manufacturing material for a cylindrical sputtering target formed from copper or a copper alloy and is provided with a continuous casting step for casting a cylindrical ingot with an average crystal grain size of 20 mm or less using a continuous casting machine or a semi-continuous casting machine and a cold rolling processing step and heat treatment step for forming material for the cylindrical sputtering target that has an average crystal grain size of 10 - 150 µm on the outer peripheral surface and wherein the surface area proportion of crystal grains of two times or greater the average crystal grain size is less than 25% of the total crystal surface area by repeatedly executing the cold rolling step and heat treatment on this cylindrical ingot.