| 发明名称 |
IMAGE SENSOR AND METHOD FOR FABRICATING THE SAME |
| 摘要 |
An image sensor includes: a substrate including a photoelectric conversion region; a charge control layer overlapping with the photoelectric conversion region that is formed over the substrate; an inter-layer dielectric layer including lines that are formed over the charge control layer; and color filters and a light condensing pattern formed over the inter-layer dielectric layer to correspond to the photoelectric conversion region. |
| 申请公布号 |
US2015295001(A1) |
申请公布日期 |
2015.10.15 |
| 申请号 |
US201414556962 |
申请日期 |
2014.12.01 |
| 申请人 |
SK hynix Inc. |
发明人 |
CHOI Chung-Seok;WOO Dong-Hyun;KIM Jong-Chae |
| 分类号 |
H01L27/146;H01L31/18;H01L31/0224 |
主分类号 |
H01L27/146 |
| 代理机构 |
|
代理人 |
|
| 主权项 |
1. An image sensor, comprising:
a substrate including a photoelectric conversion region; a charge control layer overlapping with the photoelectric conversion region that is formed over the substrate; an inter-layer dielectric layer including lines that are formed over the charge control layer; and color filters and a light condensing pattern formed over the inter-layer dielectric layer to correspond to the photoelectric conversion region. |
| 地址 |
Gyeonggi-do KR |
