| 摘要 |
A semiconductor processing device, comprising a reaction chamber (201) and an air extraction chamber (207) which is arranged at the bottom of the reaction chamber, wherein an air exhaust port (202) is provided at the bottom of the reaction chamber, an air inlet port (207c) is provided at the top of the air extraction chamber correspondingly, and the air inlet port is connected to the air exhaust port; an air outlet port (207b) is provided on a side wall of the air extraction chamber for exhausting air in the air extraction chamber; a funnel-shaped conical ring (207a) is provided in the air extraction chamber and is located below the air outlet port, wherein a lower port of the conical ring is smaller than an upper port thereof; and the conical ring is used for dividing the air extraction chamber into an upper chamber and a lower chamber, wherein the upper chamber is in communication with the lower chamber through a ring hole of the conical ring. The semiconductor processing device can reduce the accumulation of some by-product granules carried in an airflow, and can restrain the accumulated by-product granules from being raised by the airflow, thereby preventing the by-product granules from returning to the reaction chamber. |
