| 摘要 |
PROBLEM TO BE SOLVED: To provide a method of exposing a wafer by using a plurality of charged particle beamlets.SOLUTION: The present method comprises the steps of: specifying a beamlet which does not function among beamlets; assigning a first subset of beamlets, which does not include the specified beamlet which does not function in order to expose a first part of a wafer; performing first scanning for exposing the first part of the wafer by using the first subset of the beamlets; assigning a second subset of the beamlets, which does not similarly include the beamlet which does not function in order to expose a second part of the wafer; and performing second scanning for exposing the second part of the wafer by using the second subset of the beamlets, in which the first part of the wafer and the second part of the wafer do not overlap each other, and cover a whole area of the wafer required to be exposed. |
