| 发明名称 |
OVERLAP MARK SET AND METHOD FOR SELECTING RECIPE OF MEASURING OVERLAP ERROR |
| 摘要 |
An overlap mark set is provided to have at least a first and a second overlap marks both of which are located at the same pattern layer. The first overlap mark includes at least two sets of X-directional linear patterns, having a preset offset a1 therebetween; and at least two sets of Y-directional linear patterns, having the preset offset a1 therebetween. The second overlap mark includes at least two sets of X-directional linear patterns, having a preset offset b1 therebetween; and at least two sets of Y-directional linear patterns, having the preset offset b1 therebetween. The preset offsets a1 and b1 are not equal. |
| 申请公布号 |
US2015293461(A1) |
申请公布日期 |
2015.10.15 |
| 申请号 |
US201414279039 |
申请日期 |
2014.05.15 |
| 申请人 |
United Microelectronics Corp. |
发明人 |
Liou En-Chiuan;Hsu Chia-Chang;Chen Yi-Ting;Kuo Teng-Chin;Yu Chun-Chi |
| 分类号 |
G03F7/20 |
主分类号 |
G03F7/20 |
| 代理机构 |
|
代理人 |
|
| 主权项 |
1. An overlap mark set, comprising at least one first overlap mark and a second overlap mark disposed in the same pattern layer, wherein:
the first overlap mark comprises:
at least two sets of X-directional linear patterns having a preset offset a1 therebetween; andat least two sets of Y-directional linear patterns having the preset offset a1 therebetween; and the second overlap mark comprises:
at least two sets of X-directional linear patterns having a preset offset b1 therebetween; andat least two sets of Y-directional linear patterns having the preset offset b1 therebetween, wherein the preset offset a1 is not equal to the preset offset b1. |
| 地址 |
Hsinchu TW |
