| 发明名称 |
POLISHING COMPOSITION |
| 摘要 |
Provided is a polishing composition with which a high glossy surface is achieved by enhancing smoothness of a surface of an alloy material while maintaining a sufficiently high polishing speed for the alloy material. The present invention relates to a polishing composition used for an application of polishing an alloy material, which contains silica particles having a primary particle average aspect ratio of at least 1.10 and a pH controlling agent. |
| 申请公布号 |
US2015291850(A1) |
申请公布日期 |
2015.10.15 |
| 申请号 |
US201314439484 |
申请日期 |
2013.06.25 |
| 申请人 |
FUJIMI INCORPORATED |
发明人 |
Tamai Kazusei;Asai Maiko;Morinaga Hitoshi |
| 分类号 |
C09G1/02 |
主分类号 |
C09G1/02 |
| 代理机构 |
|
代理人 |
|
| 主权项 |
1. A polishing composition used for an application of polishing an alloy material, the polishing composition comprising silica particles having a primary particle average aspect ratio of at least 1.10 and a pH controlling agent. |
| 地址 |
Aichi JP |
