发明名称 SEMICONDUCTOR DEVICE AND FORMATION THEREOF
摘要 A semiconductor device and formation methods are provided. The semiconductor device includes a first metal alloy over a first active region of a fin and a second metal alloy over a second active region of the fin. A conductive layer is over a channel region of the fin. A semiconductor layer is over the conductive layer. The conductive layer over the channel region suppresses current leakage and the semiconductor layer over the conductive layer reduces electro flux from a source to a drain, as compared to a channel region that does not have such a conductive layer or a semiconductor layer over a conductive layer. The semiconductor device having the first metal alloy as at least one among the source or drain requires a lower activation temperature than a semiconductor device that does not have a metal alloy as a source or a drain.
申请公布号 KR20150116377(A) 申请公布日期 2015.10.15
申请号 KR20140184619 申请日期 2014.12.19
申请人 TAIWAN SEMICONDUCTOR MANUFACTURING CO., LTD.;NATIONAL CHIAO TUNG UNIVERSITY 发明人 CHIEN CHAO HSIN;CHUNG CHENG TING;CHEN CHE WEI
分类号 H01L29/78 主分类号 H01L29/78
代理机构 代理人
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