发明名称 |
SEMICONDUCTOR DEVICE AND FORMATION THEREOF |
摘要 |
A semiconductor device and formation methods are provided. The semiconductor device includes a first metal alloy over a first active region of a fin and a second metal alloy over a second active region of the fin. A conductive layer is over a channel region of the fin. A semiconductor layer is over the conductive layer. The conductive layer over the channel region suppresses current leakage and the semiconductor layer over the conductive layer reduces electro flux from a source to a drain, as compared to a channel region that does not have such a conductive layer or a semiconductor layer over a conductive layer. The semiconductor device having the first metal alloy as at least one among the source or drain requires a lower activation temperature than a semiconductor device that does not have a metal alloy as a source or a drain. |
申请公布号 |
KR20150116377(A) |
申请公布日期 |
2015.10.15 |
申请号 |
KR20140184619 |
申请日期 |
2014.12.19 |
申请人 |
TAIWAN SEMICONDUCTOR MANUFACTURING CO., LTD.;NATIONAL CHIAO TUNG UNIVERSITY |
发明人 |
CHIEN CHAO HSIN;CHUNG CHENG TING;CHEN CHE WEI |
分类号 |
H01L29/78 |
主分类号 |
H01L29/78 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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