| 发明名称 |
SUBSTRATE HOLDER AND A DEVICE AND A METHOD FOR TREATING SUBSTRATES |
| 摘要 |
A substrate holder having a plate element for receiving a substrate. The plate element comprises at least one recess in a first side of the plate element as well as a plurality of spacers in the at least one recess, at least one opening, which is fluidly connected to the recess and which may be connected to an external gas delivery/exhaust unit, at least one notch or channel, which radially surrounds the recess, at least one opening, which is fluidly connected to the notch or channel and may be connected to an external gas delivery/exhaust unit, a circumferential web, which radially surrounds the recess and is located between the recess and the notch or channel, and circumferential contact surfaces for the substrate, wherein a first circumferential contact surface is formed on the upper side of the web and radially surrounds the recess, such that a substrate abutting against the first contact surface forms an enclosed chamber with the recess, and a second circumferential contact surface, which radially surrounds the notch or channel. |
| 申请公布号 |
US2015294893(A1) |
申请公布日期 |
2015.10.15 |
| 申请号 |
US201314441524 |
申请日期 |
2013.11.11 |
| 申请人 |
CENTROTHERM THERMAL SOLUTIONS GMBH & CO. KG |
发明人 |
Reichart Johann Georg;Kegel Wilhelm;Kummer Günther;Obst Reinhold;Lerch Wilfried |
| 分类号 |
H01L21/683;H01L21/02;C23C16/458;C23C16/48;C23C16/455;C23C16/50 |
主分类号 |
H01L21/683 |
| 代理机构 |
|
代理人 |
|
| 主权项 |
1. A substrate holder (12) having a plate element (100) for receiving a substrate (S), wherein the plate element (100) comprises:
at least one recess (132) in a first side of the plate element (100), a plurality of spaces (135) in the at least one recess (132), at least one opening (140), which is fluidly connected to the recess (132) and may be connected to an external gas delivery/exhaust unit, at least one notch or channel (110), which radially surrounds the recess (132), at least one opening (116), which is fluidly connected to the notch or channel (110) and may be connected to an external gas delivery/exhaust unit, a circumferential web (120), which radially surrounds the recess (132) and is located between the recess (132) and the notch or channel (110), and circumferential contact surfaces (121) for the substrate, wherein a first circumferential contact surface is formed on the upper side of the web (120) and radially surrounds the recess (132), such that a substrate contacting the contact surface (121) forms a closed chamber together with the recess, and a second circumferential contact surface (121) which radially surrounds the notch or channel. |
| 地址 |
Blaubeuren DE |
