| 发明名称 |
ENHANCED PERFORMANCE METALLIC BASED OPTICAL MIRROR SUBSTRATES |
| 摘要 |
A method for coating substrates is provided. The method includes diamond turning a substrate to a surface roughness of between about 60 Å and about 100 Å RMS, wherein the substrate is one of a metal and a metal alloy. The method further includes polishing the diamond turned surface of the substrate to a surface roughness of between about 10 Å and about 25 Å to form a polished substrate, heating the polished substrate, and ion bombarding the substrate with an inert gas. The method includes depositing a coating including at least one metallic layer on the ion bombarded surface of the substrate using low pressure magnetron sputtering, and polishing the coating to form a finished surface having a surface roughness of less than about 25 Å RMS using a glycol based colloidal solution. |
| 申请公布号 |
US2015293275(A1) |
申请公布日期 |
2015.10.15 |
| 申请号 |
US201514679339 |
申请日期 |
2015.04.06 |
| 申请人 |
Corning Incorporated |
发明人 |
Crifasi Joseph Charles;Hart Gary Allen;Walton Robin Merchant;Wamboldt Leonard Gerard;Wang Jue |
| 分类号 |
G02B5/08;G02B1/14;C23C14/58;C23C14/35;C23C14/02 |
主分类号 |
G02B5/08 |
| 代理机构 |
|
代理人 |
|
| 主权项 |
1. A method for coating substrates, the method comprising:
diamond turning a substrate to a surface roughness of between about 60 Å and about 100 Å RMS, wherein the substrate is one of a metal and a metal alloy; polishing the diamond turned surface of the substrate to a surface roughness of between about 10 Å and about 25 Å to form a polished substrate; heating the polished substrate; ion bombarding the substrate with an inert gas; depositing a coating comprising at least one metallic layer on the ion bombarded surface of the substrate using low pressure magnetron sputtering; and polishing the coating to form a finished surface having a surface roughness of less than about 25 Å RMS using a glycol based colloidal solution. |
| 地址 |
Corning NY US |
