IMPRINT APPARATUS AND METHOD OF MANUFACTURING ARTICLE

摘要

The present invention provides an imprint apparatus which forms an imprint material on a substrate using a mold, comprising a driving unit driving at least one of the mold and the substrate, a measurement unit measuring a position deviation amount between the mold and the substrate, and a control unit controlling alignment between the mold and the substrate based on the position deviation amount, wherein in a first period from a start of contact between the mold and the imprint material until a distance between the mold and the substrate falls within a target range, and a second period in which the distance is maintained, the control unit obtains a command value for controlling the driving unit and controls the driving unit such that a amplification factor of the command value in the second period is larger than that in the first period.

主权项

1. An imprint apparatus which forms an imprint material on a substrate using a mold on which an unevenness pattern is formed, the apparatus comprising:
a driving unit configured to drive at least one of the mold and the substrate; a measurement unit configured to measure a position deviation amount between the mold and the substrate in a direction parallel to a surface of the substrate; and a control unit configured to control alignment between the mold and the substrate by controlling the driving unit based on the position deviation amount, wherein in a first period from a start of contact between the mold and the imprint material until a distance between the mold and the substrate falls within a target range, and a second period in which the distance is maintained within the target range, the control unit obtains a command value for controlling the driving unit based on the position deviation amount and controls the driving unit such that a amplification factor of the command value with respect to the position deviation amount in the second period is larger than that in the first period.