| 摘要 |
PROBLEM TO BE SOLVED: To provide a resist composition that can secure excellent line edge roughness (LER) in production of a resist pattern, which cannot be always satisfied in conventional resist compositions.SOLUTION: A resist composition comprises a resin having an acid-labile group, an acid generator, and a compound represented by formula (I): wherein R, Rand Reach independently represent a C1-C24 hydrocarbon group which may have a substituent and in which a methylene group can be replaced by an oxygen atom or a carbonyl group. |
