| 摘要 |
A conductive pattern can be formed using a polymeric layer that contains a reactive composition that comprises a reactive polymer that is metal ion-complexing, water-soluble, and crosslinkable. This reactive polymer comprises pendant thiosulfate groups as well as metal ion-complexing and water solubilizing groups. The reactive composition can be patternwise exposed to suitable radiation to induce crosslinking within the reactive polymer. The reactive composition and reactive polymer in the non-exposed regions can be removed due to their aqueous solubility, but the exposed regions of the polymeric layer are contacted with electroless seed metal ions, which are then reduced. The resulting electroless seed metal nuclei are electrolessly plated with a suitable metal to form the desired conductive pattern. Various articles can be prepared during this process, and the product article can be incorporated into various electronic devices. |
| 主权项 |
1. A method of forming a pattern in a polymeric layer, the method comprising:
providing a polymeric layer comprising a reactive composition comprising a non-crosslinked thiosulfate copolymer comprising, in any order: (a) recurring units comprising pendant thiosulfate groups, and (b) recurring units comprising pendant carboxy, carboxylate, phospho, phosphonate, phosphate, sulfo, sulfonate, or sulfite groups, wherein the (a) recurring units are present in an amount of at least 1 mol % and up to and including 30 mol %, and the (b) recurring units are present in an amount of at least 70 mol % and up to and including 99 mol %, both based on total recurring units in the non-crosslinked thiosulfate copolymer, patternwise exposing the polymeric layer to radiation having a λmax of at least 150 nm that is sufficient to induce crosslinking within the non-crosslinked thiosulfate copolymer, to provide a polymeric layer comprising non-exposed regions and exposed regions comprising a crosslinked polymer derived from the non-crosslinked thiosulfate copolymer, optionally heating the polymeric layer simultaneously with or after patternwise exposing the polymeric layer but before removing the reactive composition comprising the non-crosslinked thiosulfate copolymer in the non-exposed regions, at a temperature sufficient to further crosslink the crosslinked polymer in the exposed regions of the polymeric layer, removing the reactive composition comprising the non-crosslinked thiosulfate copolymer in the non-exposed regions, contacting the exposed regions of the polymeric layer comprising crosslinked polymer with electroless seed metal ions to form a pattern of electroless seed metal ions in the exposed regions of the polymeric layer, reducing the pattern of electroless seed metal ions to provide a pattern of corresponding electroless seed metal nuclei in the exposed regions of the polymeric layer, and electrolessly plating the corresponding electroless seed metal nuclei in the exposed regions of the polymeric layer with a metal that is the same as or different from the corresponding electroless seed metal nuclei. |
