发明名称 リソグラフィー用重合体の製造方法、レジスト組成物の製造方法、および基板の製造方法
摘要 <P>PROBLEM TO BE SOLVED: To provide a method for producing a polymer that has good solubility in a solvent and obtains high sensitivity when used for a resist composition. <P>SOLUTION: The method for producing a polymer includes a step of producing a polymer in a reactor while supplying a monomer and a polymerization initiator into the reactor, wherein 25 mass% or more of the total amount of supply of the polymerization initiator is supplied into the reactor when 12.5 mass% of the total amount of supply of the monomer is supplied into the reactor. <P>COPYRIGHT: (C)2011,JPO&INPIT
申请公布号 JP5793825(B2) 申请公布日期 2015.10.14
申请号 JP20090209166 申请日期 2009.09.10
申请人 三菱レイヨン株式会社 发明人 安田 敦
分类号 C08F2/00;C08F220/00;G03F7/039;H01L21/027 主分类号 C08F2/00
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