| 摘要 |
<p><P>PROBLEM TO BE SOLVED: To provide a method for easily and effectively recovering indium or an indium alloy from a high-purity indium oxide-containing scrap which is generated at manufacture or after use of an oxide scrap containing indium, in particular an indium-tin oxide (ITO) sputtering target. <P>SOLUTION: The oxide scrap 6 containing indium is inserted to a reducing furnace 1, and a reducing gas is introduced into the reducing furnace. In addition, a pressure of the reducing gas in the reducing furnace is brought into at 1.1 atmospheres or higher, the scrap is heated, and thereby the oxide scrap is reduced. <P>COPYRIGHT: (C)2013,JPO&INPIT</p> |
