发明名称 酸素含有量が低いCu−Ga系合金スパッタリングターゲット材
摘要 <p>PROBLEM TO BE SOLVED: To provide a low-oxygen Cu-Ga-based alloy sputtering target material for manufacturing a light absorption thin layer of a solar battery.SOLUTION: A Cu-Ga-based alloy sputtering target material includes, in atom %, Ga in 25% or more and 40% or less, balance Cu, and inevitable impurities. An oxygen content is less than 250 ppm, and the crystal grain size is more than 10μm and equal to or less than 35μm.</p>
申请公布号 JP5795420(B2) 申请公布日期 2015.10.14
申请号 JP20140220011 申请日期 2014.10.29
申请人 发明人
分类号 C23C14/34;B22F3/00;B22F5/00;C22C9/00 主分类号 C23C14/34
代理机构 代理人
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