| 摘要 |
Provided is an inspection apparatus capable of inspecting irregularities in a surface of an inspection object with high contrast. The inspection apparatus includes a beam generation means which generates charged particles or electromagnetic waves as a beam, a primary optical system which irradiates an inspection object with the beam, a secondary optical system which detects secondary charged particles occurring from the inspection object, and an image processing system which forms an image on the basis of the detected secondary charged particles. Irradiation energy of the beam is set in an energy region where mirror electrons are emitted as the secondary charged particles from the inspection object due to the beam irradiation. The secondary optical system includes a camera for detecting the secondary charged particles, a numerical aperture whose position is adjustable along an optical axis direction, and a lens which forms an image of the secondary charged particles which have passed through the numerical aperture on an image surface of the camera. In the image processing system, the image is formed under an aperture imaging condition where the position of the numerical aperture is located on an object surface to acquire an image. |
