发明名称 薄膜半導体装置及び薄膜半導体装置の製造方法
摘要 <p>A thin-film semiconductor device includes a semiconductor device part and a capacitor part. The semiconductor device part includes: a light-transmitting first gate electrode; a light-shielding second gate electrode; a first insulating layer; a semiconductor layer; a second insulating layer; and a source electrode and a drain electrode. The capacitor part includes: a first capacitor electrode made of a light-transmitting conductive material; a dielectric layer; and a second capacitor electrode. The second gate electrode, the semiconductor layer, and the second insulating layer have outlines that are coincident with one another in a top view.</p>
申请公布号 JP5792745(B2) 申请公布日期 2015.10.14
申请号 JP20120551416 申请日期 2011.10.28
申请人 发明人
分类号 H01L21/336;G09F9/00;G09F9/30;H01L29/417;H01L29/423;H01L29/49;H01L29/786;H01L51/50 主分类号 H01L21/336
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