| 摘要 |
<p>The invention relates to a method for producing a holographic optical element, in which a photosensitive layer is exposed at least once to interfering light beams so as to create a holographic structure. According to the inventive method, the photosensitive layer is exposed at least once in a curved state. The invention also relates to a method for producing a holographic optical element having a computer-generated light pattern. According to said method, a light pattern that is calculated for exposing a holographic structure so as to holographically store a piece of information on a planar area in such a way that said light pattern corresponds to a light pattern which reveals the stored piece of information only when the photosensitive layer that has been exposed therewith is bent during illumination with reconstruction light while the photosensitive layer is exposed to the transformed light pattern in the planar state. The invention further relates to holographic optical elements and embossed hologram structures that are produced by means of the inventive methods.</p> |
