PROCESS FOR MANUFACTURING RESIST COMPOSITION AND PATTERNING PROCESS

摘要

The purpose of the present invention is to provide a manufacturing method of a resist composition, capable of manufacturing a resist composition with reduced defect of application. As a method for manufacturing a resist composition used in a process for manufacturing a semiconductor device, the method for manufacturing the resist composition comprises: cleaning the method for manufacturing the resist composition with a cleaning solution; analyzing the cleaning solution by extracting form the manufacturing device; and manufacturing the resist composition with the manufacturing device, after cleaning until a concentration of a metal component contained in the cleaning solution is less than or equal to 5 ppb.