发明名称 Method of forming chalcopyrite thin film solar cell
摘要 In a method of forming a CIGS film absorption layer, a first precursor is provided including a first substrate having a major process precursor film formed thereon, the major process precursor film containing two or more of Cu, In, Ga, and Se. A second precursor is provided including a second substrate having an element supplying precursor film formed thereon, the element supply precursor film containing two or more of Cu, In, Ga and Se. The precursors are oriented with the major process precursor film and element supplying precursor film facing one another so as to allow diffusion of elements between the films during annealing. The oriented films are annealed and then the precursors are separated, wherein the CIGS film is formed over the first substrate and either a CIGS film or a precursor film containing two or more of Cu, In, Ga, and Se remains over the second substrate.
申请公布号 US9159863(B2) 申请公布日期 2015.10.13
申请号 US201313967549 申请日期 2013.08.15
申请人 TSMC Solar Ltd. 发明人 Wu Chung-Hsien;Lee Wen-Chin
分类号 H01L21/00;H01L31/18 主分类号 H01L21/00
代理机构 Duane Morris LLP 代理人 Duane Morris LLP
主权项 1. A method of forming a CIGS film absorption layer for a solar cell, comprising the steps of: providing a first precursor comprising a first substrate having a major process precursor film formed thereon, the major process precursor film containing two or more of Cu, In, Ga, and Se; providing a second precursor comprising a second substrate having an element supplying precursor film formed thereon, the element supply precursor film containing two or more of Cu, In, Ga and Se; orienting the precursors with the major process precursor film and element supplying precursor film facing one another so as to allow diffusion of elements between the films during annealing; annealing the oriented films; and separating the precursors after the annealing step, wherein the CIGS film is formed over the first substrate and either a CIGS film or a precursor film containing two or more of Cu, In, Ga, and Se remains over the second substrate.
地址 Taichung TW
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