Optical imaging writer system

摘要

System and method for applying mask data patterns to substrate in a lithography manufacturing process are disclosed. In one embodiment, a parallel imaging writer system includes a plurality of spatial light modulator (SLM) imaging units, where each of the plurality of SLM imaging units includes one or more illumination sources, one or more alignment sources, one or more projection lenses, and a plurality of micro mirrors configured to project light from the one or more illumination sources to the corresponding one or more projection lens. The parallel imaging writer system further includes a controller configured to control the plurality of SLM imaging units, where the controller tunes each of the SLM imaging unit individually in writing a mask data to a substrate.

主权项

1. An imaging writer system, comprising:
a plurality of spatial light modulator (SLM) imaging units, wherein each of the plurality of SLM imaging units includes one or more distinct illumination sources, one or more alignment sources, one or more projection lenses, and a plurality of micro mirrors configured to project light from the one or more distinct illumination sources to the corresponding one or more projection lens; and a controller configured to control the plurality of SLM imaging units, wherein the controller tunes each of the SLM imaging unit individually in writing a mask data to a substrate in a lithography manufacturing process.