发明名称 Systems and methods for monitoring and controlling particle sizes in slurries
摘要 Systems and methods are provided for preparing a plurality of slurry particles. The system includes: a tank configured to contain and provide the slurry particles, a sampling module configured to sample at least one slurry particle within the tank and obtain at least one parameter related to a particle size, and a controller coupled to the tank and the sampling module, configured to vibrate the slurry particles within the tank based on the at least one parameter.
申请公布号 US9159573(B2) 申请公布日期 2015.10.13
申请号 US201314132167 申请日期 2013.12.18
申请人 Taiwan Semiconductor Manufacturing Company Limited 发明人 Chiang I-Chen;Chen Yung-Long;Tseng Chih-Chiang;Yin Chi-Chan
分类号 H01L21/44;E03B1/00;F17D1/00;F17D3/00;F17D1/16;F17D1/18;B24B1/00;B24B7/19;B24B7/30;H01L21/306;B01F11/00;B01F15/00;H01L21/66;H01L21/67 主分类号 H01L21/44
代理机构 Jones Day 代理人 Jones Day
主权项 1. A system for preparing a plurality of slurry particles, the system comprising: a source tank configured to store and provide a stock slurry containing the slurry particles; a mixing tank coupled downstream of the source tank; a sampling module coupled between the source tank and the mixing tank configured to sample the slurry particles and obtain at least one particle size parameter associated with the slurry particles; an ultrasonic vibrator arranged in a circulation path to the source tank; and a controller coupled to the ultrasonic vibrator and the sampling module, controlling the ultrasonic vibrator to vibrate the slurry particles based on the at least one particle size parameter.
地址 Hsinchu TW