发明名称 |
Systems and methods for monitoring and controlling particle sizes in slurries |
摘要 |
Systems and methods are provided for preparing a plurality of slurry particles. The system includes: a tank configured to contain and provide the slurry particles, a sampling module configured to sample at least one slurry particle within the tank and obtain at least one parameter related to a particle size, and a controller coupled to the tank and the sampling module, configured to vibrate the slurry particles within the tank based on the at least one parameter. |
申请公布号 |
US9159573(B2) |
申请公布日期 |
2015.10.13 |
申请号 |
US201314132167 |
申请日期 |
2013.12.18 |
申请人 |
Taiwan Semiconductor Manufacturing Company Limited |
发明人 |
Chiang I-Chen;Chen Yung-Long;Tseng Chih-Chiang;Yin Chi-Chan |
分类号 |
H01L21/44;E03B1/00;F17D1/00;F17D3/00;F17D1/16;F17D1/18;B24B1/00;B24B7/19;B24B7/30;H01L21/306;B01F11/00;B01F15/00;H01L21/66;H01L21/67 |
主分类号 |
H01L21/44 |
代理机构 |
Jones Day |
代理人 |
Jones Day |
主权项 |
1. A system for preparing a plurality of slurry particles, the system comprising:
a source tank configured to store and provide a stock slurry containing the slurry particles; a mixing tank coupled downstream of the source tank; a sampling module coupled between the source tank and the mixing tank configured to sample the slurry particles and obtain at least one particle size parameter associated with the slurry particles; an ultrasonic vibrator arranged in a circulation path to the source tank; and a controller coupled to the ultrasonic vibrator and the sampling module, controlling the ultrasonic vibrator to vibrate the slurry particles based on the at least one particle size parameter. |
地址 |
Hsinchu TW |