Semiconductor processing dispatch control

摘要

An embodiment is a method for semiconductor processing control. The method comprises identifying a key process stage from a plurality of process stages based on a parameter of processed wafers, forecasting a trend for a wafer processed by the key process stage and some of the plurality of process stages based on the parameter, and dispatching the wafer to one of a first plurality of tools in a tuning process stage. The one of the first plurality of tools is determined based on the trend.

主权项

1. A method for semiconductor processing control, the method comprising:
using at least one processor:
identifying a key process stage from a plurality of process stages based on a parameter of processed wafers, wherein the identifying the key process stage comprises:
providing a data set of measured results of the parameter for the processed wafers, wherein the data set comprises a plurality of subsets, each of the plurality of subsets corresponding to the measured results of some of the processed wafers processed by one of multiple tools in each of the plurality of processing stages;determining an average tool effect and a standard deviation tool effect for each of the multiple tools in each of the plurality of processing stages based on a respective corresponding one of the plurality of subsets;determining an index for each of the plurality of processing stages based on the average tool effect and the standard deviation tool effect for each of the multiple tools in the respective one of the plurality of processing stages; andidentifying the key process stage when the index for the key processing stage is above a threshold;forecasting a trend for a wafer processed by the key process stage and some of the plurality of process stages based on the parameter; anddispatching the wafer to one of a first plurality of tools in a tuning process stage, wherein the one of the first plurality of tools is determined based on the trend.