发明名称 Plasma arc chamber
摘要 The plasma arc chamber is made in part of a one piece base fabricated from 95.95% pure tungsten having four rigid walls defining a rectangular central opening. A bottom plate closes the bottom of the base and a cover with a slit for the passage of an ion beam closes the top of the base. Liners are fitted into the bottom plate, the top of base and against the four walls of the base.
申请公布号 US9159526(B1) 申请公布日期 2015.10.13
申请号 US201414222147 申请日期 2014.03.21
申请人 ion TECHNOLOGY SOLUTIONS, LLC 发明人 Jerez Manuel A.;Borges Carlos F. M.
分类号 H01J17/26;H01J37/04;H05H1/34 主分类号 H01J17/26
代理机构 Carella, Byrne, Et Al 代理人 Hand Francis C.;Carella, Byrne, Et Al
主权项 1. A plasma arc chamber comprising a one piece base having four walls defining a rectangular central opening; a bottom plate secured to said four walls of said base to close one end of said opening; a cover removably mounted on said four walls of said base to close an opposite end of said opening and having a first slit for passage of an ion beam therethrough; a liner on an underside of said cover and having a second slit in alignment with said first slit for passage of the ion beam therethrough.
地址 Mineola NY US