发明名称 Semiconductor chip and stacked semiconductor package having the same
摘要 A semiconductor chip includes a substrate, through-electrodes passing through the substrate, and a dielectric layer formed between the substrate and the through-electrodes and having a dielectric constant decreasing structure.
申请公布号 US9159709(B2) 申请公布日期 2015.10.13
申请号 US201414516672 申请日期 2014.10.17
申请人 SK Hynix Inc. 发明人 Son Ho Young
分类号 H01L23/48;H01L23/58;H01L25/10;H01L25/03;H01L25/065;H01L21/768;H01L23/31;H01L23/00 主分类号 H01L23/48
代理机构 William Park & Associates Ltd. 代理人 William Park & Associates Ltd.
主权项 1. A stacked semiconductor package comprising: a plurality of semiconductor chips each including a substrate, through-electrodes passing through the substrate and a dielectric layer with a reduced dielectric constant formed between the substrate and the through-electrodes where the dielectric layer with a reduced dielectric constant has at least one air gap, and stacked such that through-electrodes of the plurality of semiconductor chips are connected with one another, Wherein the semiconductor chips includes a first semiconductor chip, a second semiconductor chip which is stacked under the first semiconductor chip, and a third semiconductor chip which is stacked under the second semiconductor chip, and wherein the dielectric layer with a reduced dielectric constant of the third semiconductor chip has a highest dielectric constant among the semiconductor chips, dielectric constants of dielectric layers with a reduced dielectric constant gradually decrease toward the first semiconductor chip, and the dielectric layer with a reduced dielectric constant of the first semiconductor chip has a lowest dielectric constant, Wherein the dielectric layer of the third semiconductor chip comprises a double-layered structure of a porous dielectric layer which has a plurality of air gaps therein and an air gap-free dielectric layer which has no air gap therein, the dielectric layer of the second semiconductor chip comprises a single-layered structure of a porous dielectric layer, and the dielectric layer of the first semiconductor chip comprises a single-layered structure of a hollow type dielectric layer which has an air gap defined in a center portion thereof.
地址 Gyeonggi-do KR