Multi charged particle beam writing method, and multi charged particle beam writing apparatus

摘要

A multi charged particle beam writing apparatus includes a beam forming member, where first openings for writing and second openings not for writing around the first openings are formed, to form multiple beams for writing and to form multiple beams for measurement, plural mark members on a blanking aperture member arranged close to the height position where crossover is formed, a measurement unit to measure positions of the multiple beams for measurement by the plural mark members, and a correction unit to correct a voltage for making a “beam on” state applied to one of the plural blankers, in order to correct a position deviation amount of a measured position.

主权项

1. A multi charged particle beam writing apparatus comprising:
an emission unit configured to emit a charged particle beam; a beam forming member, in which a plurality of first openings for writing and a plurality of second openings not for writing around the plurality of first openings are formed, configured to form multiple beams for writing by letting a region including a whole of the plurality of first openings and the plurality of second openings be irradiated with the charged particle beam and letting portions of the charged particle beam respectively pass through a corresponding opening of the plurality of first openings, and to form multiple beams for measurement by letting portions of the charged particle beam respectively pass through the plurality of second openings; a blanking plate having a plurality of blankers configured to respectively perform blanking deflection for a corresponding beam in the multiple beams for writing having passed through the plurality of first openings and the multiple beams for measurement having passed through the plurality of second openings of the beam forming member; a converging lens configured to converge the multiple beams for writing and the multiple beams for measurement which have passed through the blanking plate; a blanking aperture member, which is arranged close to a height position where the multiple beams for writing and the multiple beams for measurement form a crossover and in which a limiting aperture is formed, configured to block each beam in the multiple beams for writing, which was deflected to be in a “beam off” state by one of the plurality of blankers, at a position displaced from the limiting aperture, and to let each beam to be in a “beam on” state pass through the limiting aperture; a plurality of mark members arranged on the blanking aperture member, which is arranged close to the height position where the crossover is formed, or arranged between the blanking aperture member and the blanking plate; a measurement unit configured to measure positions of the multiple beams for measurement by using the plurality of mark members; and a correction unit configured to correct a voltage for making a “beam on” state to be applied to one of the plurality of blankers, which performs blanking deflection for one of the multiple beams for writing, in order to correct a position deviation amount of a measured position in the positions of the multiple beams for measurement.