发明名称 |
Optical wavelength dispersion device and method of manufacturing the same |
摘要 |
An optical wavelength dispersion device includes a first substrate; an input unit formed on the first substrate having a slit for receiving an optical signal; a grating formed on the first substrate for producing a first light beam form the optical signal for outputting; and a second substrate covered on the top of the input unit and the grating; wherein the input unit and the grating are formed from a photo-resist layer by high energy light source exposure. |
申请公布号 |
US9157799(B2) |
申请公布日期 |
2015.10.13 |
申请号 |
US201514619027 |
申请日期 |
2015.02.10 |
申请人 |
PHOTON CHIP, INC. |
发明人 |
Ko Cheng-Hao |
分类号 |
G02B6/26;G03F7/16;G03F7/30;G01J3/02;G01J3/04;G02B6/12;G02B6/138;G02B6/293;G03F7/00;G03F7/20 |
主分类号 |
G02B6/26 |
代理机构 |
David and Raymond Patent Firm |
代理人 |
Chan Raymond Y.;David and Raymond Patent Firm |
主权项 |
1. A method of manufacturing an optical wavelength dispersion device, the method comprising the steps of:
(a) providing a first substrate; (b) forming a photo-resist layer on said first substrate; (c) exposing said photo-resist layer by high energy light source through a high-energy-light-source mask, wherein a wavelength of said high energy light source is from 0.01 to 100 nm; (d) developing said photo-resist layer for forming an input unit with a slit and a grating; (e) coating a reflective layer on a surface of each of said first substrate, said input unit and said grating; and (f) covering a second substrate on top of said input unit and said grating. |
地址 |
Wilmington DE US |