| 发明名称 | Polishing composition | ||
| 摘要 | A polishing composition contains colloidal silica. The colloidal silica satisfies the expression A×D×E×F≧350,000 where “A” denotes the average aspect ratio (dimensionless) of the colloidal silica, “D” denotes the average particle diameter (units: nm) of the colloidal silica, “E” denotes the standard deviation of the particle size (units: nm) of the colloidal silica, and “F” denotes the volume fraction (units: %) of particles having a diameter of 1 to 300 nm in the colloidal silica. The volume fraction of particles having a diameter of 1 to 300 nm in the colloidal silica is 90% or greater. | ||
| 申请公布号 | US9157011(B2) | 申请公布日期 | 2015.10.13 |
| 申请号 | US201113818554 | 申请日期 | 2011.08.25 |
| 申请人 | FUJIMI INCORPORATED | 发明人 | Ashitaka Keiji;Morinaga Hitoshi;Tahara Muneaki |
| 分类号 | C09G1/00;C09G1/02;C09K3/14;H01L21/02;H01L21/3105;B24D3/02;C09C1/68 | 主分类号 | C09G1/00 |
| 代理机构 | Foley & Lardner LLP | 代理人 | Foley & Lardner LLP |
| 主权项 | 1. A polishing composition comprising colloidal silica, wherein when “A” denotes an average aspect ratio (dimensionless) of the colloidal silica; “D” denotes an average particle diameter (units: nm) of the colloidal silica; “E” denotes a standard deviation of the particle diameter (units: nm) of the colloidal silica; and “F” denotes a volume fraction (units: %) of particles having a diameter of 1 to 300 nm in the colloidal silica, a value obtained by the expression A×D×E×F is 350.000 or greater, the volume fraction of particles having a diameter of 1 to 300 nm in the colloidal silica is 90% or greater, the volume fraction of particles having a diameter of 50 nm or greater and an aspect ratio of 1.2 or greater in the colloidal silica is 50% or greater, the standard deviation of the particle diameter of the colloidal silica is 34.2 nm or more. | ||
| 地址 | Kiyosu-shi JP | ||