LOW PRESSURE PLASMA REACTOR FOR EXHAUST GAS TREATMENT

摘要

The present invention relates to an apparatus which includes a housing and a magnetic field generating unit, capable of performing a safe treatment by including a dual chamber structure and continuously treating exhaust fluid by minimizing the inner surface etching of a dielectric due to an ion collision in a low pressure plasma reactor to treat the exhaust fluid even though the exhaust fluid of a processing chamber includes fluorine or chlorine gas. For this, a magnetic field value inducing the reduction of the surface etching of the dielectric due to a plasma ion is optimized and applied. The housing physically seals a dielectric tube, a driving electrode surrounding the outer side thereof with a ring shape, and the magnetic field generating unit, and shields an electromagnetic wave.